Advances in CMP/polishing technologies for the manufacture of electronic devices

Author：edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa.
Publisher：William Andrew
ISBN：9781437778595 ; 1437778593
Publication Date：2012
其他作者：Doi, Toshiro. ; Marinescu, Ioan D. ; Kurokawa, Syuhei.
版次：1st ed.
語言：zh
出版地：Oxford :
Description

1 online resource (xii, 317 p.)

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